| Magnetic spin–orbit interaction of light M Wang, H Zhang, T Kovalevich, R Salut, MS Kim, MA Suarez, MP Bernal, ... Light: Science & Applications 7 (1), 24, 2018 | 41 | 2018 |
| Polarization controlled directional propagation of Bloch surface wave T Kovalevich, P Boyer, M Suarez, R Salut, MS Kim, HP Herzig, MP Bernal, ... Optics Express 25 (5), 5710-5715, 2017 | 37 | 2017 |
| Tunable Bloch surface waves in anisotropic photonic crystals based on lithium niobate thin films T Kovalevich, A Ndao, M Suarez, S Tumenas, Z Balevicius, ... Optics Letters 41 (23), 5616-5619, 2016 | 35 | 2016 |
| Bloch surface waves at the telecommunication wavelength with lithium niobate as the top layer for integrated optics T Kovalevich, D Belharet, L Robert, G Ulliac, MS Kim, HP Herzig, ... Applied optics 58 (7), 1757-1762, 2019 | 29 | 2019 |
| Experimental evidence of Bloch surface waves on photonic crystals with thin-film LiNbO3 as a top layer T Kovalevich, D Belharet, L Robert, MS Kim, HP Herzig, T Grosjean, ... Photonics research 5 (6), 649-653, 2017 | 25 | 2017 |
| Experimental evidence of Bloch surface waves on photonic crystals with thin-film LiNbO3 as a top layer T Kovalevich, D Belharet, L Robert, MS Kim, HP Herzig, T Grosjean, ... Photonics research 5 (6), 649-653, 2017 | 25 | 2017 |
| Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align JH Franke, A Frommhold, N Davydova, R Aubert, VV Nair, T Kovalevich, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 43-62, 2021 | 19 | 2021 |
| Stitching for High NA: new insights and path forward NV Davydova, V Wiaux, J Bekaert, FJ Timmermans, B Slachter, ... International Conference on Extreme Ultraviolet Lithography 2022, PC1229210, 2022 | 8 | 2022 |
| Overview of stitching for high NA: imaging and overlay experimental and simulation results N Davydova, L van Look, V Wiaux, J Bekaert, F Timmermans, ... Optical and EUV Nanolithography XXXVI 12494, 233-251, 2023 | 7 | 2023 |
| Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask T Kovalevich, L Van Look, JH Franke, V Philipsen Journal of Micro/Nanopatterning, Materials, and Metrology 22 (2), 024401-024401, 2023 | 6 | 2023 |
| Stitching enablement for anamorphic imaging: a~ 1μm exclusion band and its implications V Wiaux, J Bekaert, T Kovalevich, J Ryckaert, E Hendrickx, N Davydova, ... Extreme Ultraviolet Lithography 2020 11517, 76-83, 2020 | 6 | 2020 |
| Resist and reticle activities towards High-NA EUV ecosystem readiness J Santaclara, W Gao, E Hendrickx, V Wiaux, JH Franke, E Gallagher, ... Optical and EUV Nanolithography XXXV, PC1205105, 2022 | 5 | 2022 |
| Imaging validation for LS of dark field low-n vs Ta-based absorber masks T Kovalevich, L Van Look, A Moussa, JH Franke, V Philipsen International Conference on Extreme Ultraviolet Lithography 2023 12750, 2023 | 2 | 2023 |
| Mask roughness contribution to wafer edge placement error A Frommhold, JH Franke, T Kovalevich, E Van Setten, V Vaenkatesan Optical and EUV Nanolithography XXXVI 12494, 53-60, 2023 | 2 | 2023 |
| Critical pattern behavior at nanometer scale vicinity of black border T Kovalevich, J Bekaert, V Wiaux, J Liddle, N Davydova, MC Tien | 2 | 2019 |
| An experimental stitching study on the eve of high-NA EUV V Wiaux, N Davydova, L Van Look, N Pellens, A Weldeslassie, G Libeert, ... Optical and EUV Nanolithography XXXVII 12953, 172-182, 2024 | 1 | 2024 |
| Evaluation of LS printing and general understanding of imaging with DF low-n mask T Kovalevich, L Van Look, JH Franke, V Philipsen International Conference on Extreme Ultraviolet Lithography 2022, PC122920M, 2022 | 1 | 2022 |
| Tunable Bloch surface waves devices T Kovalevich arXiv preprint arXiv:1807.05268, 2018 | 1 | 2018 |
| Mask innovations on the eve of high NA EUV lithography V Philipsen, A Frommhold, D Thakare, G Libeert, I Lee, JH Franke, ... Japanese Journal of Applied Physics 63 (4), 040804, 2024 | | 2024 |
| Study of MEEF improvement with low-n absorber EUVL mask Y Takahata, T Kovalevich, D De Simone, Y Tanaka, V Philipsen Optical and EUV Nanolithography XXXVII 12953, 70-82, 2024 | | 2024 |
