Charging effects in silicon nanocrystals within DN Kouvatsos, V Ioannou-Sougleridis, AG Nassiopoulou
Applied physics letters 82 (3), 397-399, 2003
145 2003 Photoluminescence from nanocrystalline silicon in P Photopoulos, AG Nassiopoulou, DN Kouvatsos, A Travlos
Applied Physics Letters 76 (24), 3588-3590, 2000
133 2000 High-performance thin-film transistors in large grain size polysilicon deposited by thermal decomposition of disilane DN Kouvatsos, AT Voutsas, MK Hatalis
IEEE Transactions on Electron Devices 43 (9), 1399-1406, 1996
59 1996 Fluorine‐Enhanced Oxidation of Silicon: Effects of Fluorine on Oxide Stress and Growth Kinetics D Kouvatsos, JG Huang, RJ Jaccodine
Journal of the Electrochemical Society 138 (6), 1752, 1991
50 1991 Photo-and electroluminescence from nanocrystalline silicon single and multilayer structures P Photopoulos, AG Nassiopoulou, DN Kouvatsos, A Travlos
Materials Science and Engineering: B 69, 345-349, 2000
46 2000 Nickel nanoparticle deposition at room temperature for memory applications E Verrelli, D Tsoukalas, K Giannakopoulos, D Kouvatsos, P Normand, ...
Microelectronic engineering 84 (9-10), 1994-1997, 2007
35 2007 Interface state density reduction and effect of oxidation temperature on fluorine incorporation and profiling for fluorinated metal oxide semiconductor capacitors DN Kouvatsos, FA Stevie, RJ Jaccodine
Journal of the Electrochemical Society 140 (4), 1160, 1993
29 1993 Polycrystalline silicon thin film transistors fabricated in various solid phase crystallized films deposited on glass substrates DN Kouvatsos, AT Voutsas, MK Hatalis
Journal of electronic materials 28, 19-25, 1999
28 1999 Influence of a high electric field on the photoluminescence from silicon nanocrystals in SiO2 V Ioannou-Sougleridis, B Kamenev, DN Kouvatsos, AG Nassiopoulou
Materials Science and Engineering: B 101 (1-3), 324-328, 2003
27 2003 Characterization of various low-k dielectrics for possible use in applications at temperatures below 160° C M Vasilopoulou, S Tsevas, AM Douvas, P Argitis, D Davazoglou, ...
Journal of Physics: Conference Series 10 (1), 218, 2005
23 2005 Influence of polysilicon film thickness on radiation response of advanced excimer laser annealed polycrystalline silicon thin film transistors V Davidović, DN Kouvatsos, N Stojadinović, AT Voutsas
Microelectronics Reliability 47 (9-11), 1841-1845, 2007
20 2007 Charging effects in silicon nanocrystals embedded in SiO2 films DN Kouvatsos, V Ioannou-Sougleridis, AG Nassiopoulou
Materials Science and Engineering: B 101 (1-3), 270-274, 2003
20 2003 Effect of silicon thickness on the degradation mechanisms of sequential laterally solidified polycrystalline silicon TFTs during hot-carrier stress AT Voutsas, DN Kouvatsos, L Michalas, GJ Papaioannou
IEEE electron device letters 26 (3), 181-184, 2005
18 2005 Silicon‐fluorine bonding and fluorine profiling in SiO2 films grown by NF3 ‐enhanced oxidation D Kouvatsos, FP McCluskey, RJ Jaccodine, FA Stevie
Applied physics letters 61 (7), 780-782, 1992
17 1992 Short channel effects on LTPS TFT degradation DC Moschou, CG Theodorou, NA Hastas, A Tsormpatzoglou, ...
Journal of Display Technology 9 (9), 747-754, 2012
16 2012 Characterization of various insulators for possible use as low-k dielectrics deposited at temperatures below 200° C M Vasilopoulou, AM Douvas, D Kouvatsos, P Argitis, D Davazoglou
Microelectronics Reliability 45 (5-6), 990-993, 2005
16 2005 Thin film transistors in low temperature as-deposited and reduced-crystallization-time polysilicon on 665° C strain point glass substrates MK Hatalis, DN Kouvatsos, JH Kung, AT Voutsas, J Kanicki
Thin solid films 338 (1-2), 281-285, 1999
16 1999 Characterization of double gate TFTs fabricated in advanced SLS ELA polycrystalline silicon films DN Kouvatsos, FV Farmakis, DC Moschou, GP Kontogiannopoulos, ...
Solid-state electronics 51 (6), 936-940, 2007
15 2007 Fluorine‐enhanced oxidation of polycrystalline silicon and application to thin‐film transistor fabrication DN Kouvatsos, MK Hatalis, RJ Jaccodine
Applied physics letters 61 (8), 937-939, 1992
14 1992 SiO2 Film Stress—Thickness Dependence, Non‐Planar Oxidation, and Fluorine‐Related Effects D Kouvatsos, JG Huang, V Saikumar, PJ Macfarlane, RJ Jaccodine, ...
Journal of the Electrochemical Society 139 (8), 2322, 1992
14 1992 