Andreas Vetter
Andreas Vetter
Alcon Wavelight
Zweryfikowany adres z alcon.com - Strona główna
Tytuł
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Cytowane przez
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Fully integrated quantum photonic circuit with an electrically driven light source
S Khasminskaya, F Pyatkov, K Słowik, S Ferrari, O Kahl, V Kovalyuk, ...
Nature Photonics 10 (11), 727-732, 2016
1702016
Cavity-Enhanced and Ultrafast Superconducting Single-Photon Detectors
A Vetter, S Ferrari, P Rath, R Alaee, O Kahl, V Kovalyuk, S Diewald, ...
Nano Letters 16 (11), 7085-7092, 2016
462016
Superconducting nanowire single-photon detector implemented in a 2D photonic crystal cavity
J Münzberg, A Vetter, F Beutel, W Hartmann, S Ferrari, WHP Pernice, ...
Optica 5 (5), 658-665, 2018
402018
Spectrally multiplexed single-photon detection with hybrid superconducting nanophotonic circuits
O Kahl, S Ferrari, V Kovalyuk, A Vetter, G Lewes-Malandrakis, C Nebel, ...
Optica 4 (5), 557-562, 2017
302017
High Efficiency On-Chip Single-Photon Detection for Diamond Nanophotonic Circuits
O Kahl, S Ferrari, P Rath, A Vetter, C Nebel, WHP Pernice
Journal of Lightwave Technology 34 (2), 249-255, 2016
172016
Hot-spot relaxation time current dependence in niobium nitride waveguide-integrated superconducting nanowire single-photon detectors
S Ferrari, V Kovalyuk, W Hartmann, A Vetter, O Kahl, C Lee, A Korneev, ...
Optics Express 25 (8), 8739-8750, 2017
152017
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm
R Kirner, A Vetter, D Opalevs, C Gilfert, M Scholz, P Leisching, T Scharf, ...
Optics Express 26 (2), 730-743, 2018
122018
Inverse photonic design of functional elements that focus Bloch surface waves
Y Augenstein, A Vetter, BV Lahijani, HP Herzig, C Rockstuhl, MS Kim
Light: Science & Applications 7 (1), 1-9, 2018
102018
Travelling-wave single-photon detectors integrated with diamond photonic circuits-operation at visible and telecom wavelengths with a timing jitter down to 23 ps
P Rath, A Vetter, V Kovalyuk, S Ferrari, O Kahl, C Nebel, GN Goltsman, ...
SPIE OPTO, 97500T-97500T-8, 2016
102016
Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source
A Vetter, R Kirner, D Opalevs, M Scholz, P Leisching, T Scharf, W Noell, ...
Optics Express 26 (17), 22218-22233, 2018
92018
Nat. Photonics 10, 727 (2016)
S Khasminskaya, F Pyatkov, K Słowik, S Ferrari, O Kahl, V Kovalyuk, ...
82016
Gol, tsman
S Khasminskaya, F Pyatkov, K Słowik, S Ferrari, O Kahl, V Kovalyuk, ...
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7
Achieving highly stable, reversibly reconfigurable plasmonic nanocrystal superlattices through the use of semifluorinated surface ligands
M Bagiński, E Tomczyk, A Vetter, RNS Suryadharma, C Rockstuhl, ...
Chemistry of Materials 30 (22), 8201-8210, 2018
52018
Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications
D Opalevs, M Scholz, J Stuhler, C Gilfert, LJ Liu, XY Wang, A Vetter, ...
Solid State Lasers XXVII: Technology and Devices 10511, 105112C, 2018
52018
Optica 5, 658 (2018)
J Münzberg, A Vetter, F Beutel, W Hartmann, S Ferrari, WHP Pernice, ...
5
Analysis of the detection response of waveguide-integrated superconducting nanowire single-photon detectors at high count rate
S Ferrari, V Kovalyuk, A Vetter, C Lee, C Rockstuhl, A Semenov, ...
Applied Physics Letters 115 (10), 101104, 2019
42019
Multiple self-healing Bloch surface wave beams generated by a two-dimensional fraxicon
MS Kim, A Vetter, C Rockstuhl, BV Lahijani, M Häyrinen, M Kuittinen, ...
Communications Physics 1 (1), 1-8, 2018
42018
Mask-aligner Talbot lithography using a 193 nm CW light source
A Vetter, R Kirner, D Opalevs, M Scholz, P Leisching, T Scharf, W Noell, ...
Optical Microlithography XXXI 10587, 105870W, 2018
42018
High-resolution interference microscopy with spectral resolution for the characterization of individual particles and self-assembled meta-atoms
M Symeonidis, RNS Suryadharma, R Grillo, A Vetter, C Rockstuhl, T Bürgi, ...
Optics Express 27 (15), 20990-21003, 2019
32019
Enabling proximity mask-aligner lithography with a 193nm CW light source
R Kirner, A Vetter, D Opalevs, M Scholz, P Leisching, T Scharf, W Noell, ...
Optical Microlithography XXXI 10587, 105871F, 2018
32018
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