| On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films MI Alayo, I Pereyra, WL Scopel, MCA Fantini Thin Solid Films 402 (1-2), 154-161, 2002 | 211 | 2002 |
| Thick SiOxNy and SiO2 films obtained by PECVD technique at low temperatures MI Alayo, I Pereyra, MNP Carreno Thin Solid Films 332 (1-2), 40-45, 1998 | 120 | 1998 |
| High quality low temperature DPECVD silicon dioxide I Pereyra, MI Alayo Journal of Non-Crystalline Solids 212 (2-3), 225-231, 1997 | 97 | 1997 |
| Wide gap a-Si1− xCx: H thin films obtained under starving plasma deposition conditions I Pereyra, MNP Carreño Journal of non-crystalline solids 201 (1-2), 110-118, 1996 | 77 | 1996 |
| Study of nitrogen-rich silicon oxynitride films obtained by PECVD D Criado, I Pereyra, MI Alayo Materials Characterization 50 (2-3), 167-171, 2003 | 70 | 2003 |
| Wide optical band gap window layers for solar cells Z Yu, I Pereyra, MNP Carreno Solar energy materials and solar cells 66 (1-4), 155-162, 2001 | 66 | 2001 |
| Study of MOS capacitors with TiO2 and SiO2/TiO2 gate dielectric KF Albertin, MA Valle, I Pereyra Journal of Integrated Circuits and Systems 2 (2), 89-93, 2007 | 64 | 2007 |
| National prevalence of larval echinococcosis in sheep in slaughtering plants Ovis aries as an indicator in control programmes in Uruguay PA Cabrera, P Irabedra, D Orlando, L Rista, G Harán, G Viñals, ... Acta tropica 85 (2), 281-285, 2003 | 63 | 2003 |
| The influence of “starving plasma” regime on carbon content and bonds in a-Si1− xCx: H thin films I Pereyra, MNP Carreno, MH Tabacniks, RJ Prado, MCA Fantini Journal of applied physics 84 (5), 2371-2379, 1998 | 63 | 1998 |
| Microvoids in diamond‐like amorphous silicon carbide MNP Carreno, I Pereyra, MCA Fantini, H Takahashi, R Landers Journal of applied physics 75 (1), 538-542, 1994 | 62 | 1994 |
| On the structural properties of a‐Si1−xCx:H thin films V Mastelaro, AM Flank, MCA Fantini, DRS Bittencourt, MNP Carreño, ... Journal of applied physics 79 (3), 1324-1329, 1996 | 59 | 1996 |
| Local structure and bonds of amorphous silicon oxynitride thin films WL Scopel, MCA Fantini, MI Alayo, I Pereyra Thin solid films 413 (1-2), 59-64, 2002 | 57 | 2002 |
| Low temperature plasma enhanced chemical vapour deposition boron nitride MNP Carreno, JP Bottecchia, I Pereyra Thin Solid Films 308, 219-222, 1997 | 57 | 1997 |
| Amorphous hydrogenated carbon-nitride films prepared by RF-PECVD in methane–nitrogen atmospheres EF Motta, I Pereyra Journal of Non-Crystalline Solids 338, 525-529, 2004 | 54 | 2004 |
| Silicon rich silicon oxynitride films for photoluminescence applications M Ribeiro, I Pereyra, MI Alayo Thin Solid Films 426 (1-2), 200-204, 2003 | 44 | 2003 |
| PECVD-SiOxNy films for large area self-sustained grids applications MNP Carreno, MI Alayo, I Pereyra, AT Lopes Sensors and Actuators A: Physical 100 (2-3), 295-300, 2002 | 43 | 2002 |
| Structural analysis of silicon oxynitride films deposited by PECVD D Criado, MI Alayo, I Pereyra, MCA Fantini Materials Science and Engineering: B 112 (2-3), 123-127, 2004 | 42 | 2004 |
| Annealing effects of highly homogeneous a-Si1− xCx: H RJ Prado, TF D’addio, MCA Fantini, I Pereyra, AM Flank Journal of non-crystalline solids 330 (1-3), 196-215, 2003 | 39 | 2003 |
| Study of reactive sputtering titanium oxide for metal-oxide-semiconductor capacitors KF Albertin, I Pereyra Thin Solid Films 517 (16), 4548-4554, 2009 | 38 | 2009 |
| Crystalline silicon oxycarbide: Is there a native oxide for silicon carbide? CRS da Silva, JF Justo, I Pereyra Applied physics letters 84 (24), 4845-4847, 2004 | 35 | 2004 |
